Dry Asher Etcher RIE ICP Equipment > Lam Research 4520/4420 Rainbow Oxide Etcher(Danville, CA)

Dry Asher Etcher RIE ICP Equipment > Lam Research 4520/4420 Rainbow Oxide Etcher Please contact us by http://www.globalnanotechequipment.com sales@globalnanotechequipment.com for more information. Manufacturer:Lam Research Condition:Refurbished to OEM SPEC (Installation and warranty are optional) Price:Contact Us Now Location:California,USA Amount: 6 sets Description for reference only(One of the unit). * Configured for 6" wafers * Classic control system * Bulkhead mount system * Momentary EMO * Hine 38A open cassette SEND indexer * Belt driven load station * Standard load station shuttle spatula * 6-gas box configuration * Standard gas box * Rear gas panel exhaust * [5Ra] gas weldment polish * Unit mass flow controllers Gas 1: Ar (1 slm) Gas 2: CF4 (50 sccm) Gas 3: CHF3 (50 sccm) Gas 4: He (1 slm) Gas 5: Ar (200 sccm) Gas 6: N2 (100 sccm) UPC: He (50 sccm) * AC input box (fuses) * 400 Khz RF power frequency * AE PDW-2200 RF generator on cart * 6" entrance loadlock wafer holder (Tight-pocket) * Variable upper chamber gap * LoFAT RF power tuning * Silicon upper chamber electrode * 6" lower chamber electrode (Non-ESC) * TAC for lower chamber wafer clamping * Single chamber monochromators * Non-heated endpoint window * Low pressure chamber manifolding * HPS valve for chamber isolation * AC-2 chamber pressure control * 10 Torr chamber manometer * 10 Torr wafer area pressure manometer * 100 Torr backside He manometer * 6" exit loadlock wafer holder * Hine 38A RECEIVE indexer * 3-light Light Tower Please also refer to Lam Research 4420 Rainbow Nitride Poly Etcher;Lam Research AutoEtch 590 Oxide Etcher;Lam Research AutoEtch 590 Oxide Etcher;Lam Research AutoEtch 490 Nitride Poly EtcherPlease contact us by http://www.globalnanotechequipment.com sales@globalnanotechequipment.com for more information. .